STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS

TitleSTRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS
Publication TypeConference Proceedings
Year of Publication1993
AuthorsQadri, S. B., Skelton E. F., Shimkunas A. R., and Butler J. E.
Conference Name20th International Conference on Metallurgical Coatings and Thin Films
Pagination346-348
Conference LocationSan Diego, Ca
ISBN Number0257-8972
Abstract

SiC films 0.2-2.0 mum thick have been characterized structurally by X-ray diffraction techniques. The films were deposited by electron cyclotron resonance-chemical vapor deposition techniques. No evidence of crystallinity was observed for films with thicknesses less than 1 mum; these are presumed to be amorphous. Thicker films were found to have crystallized predominantly in the a phase of SiC.