STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS
|Title||STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS|
|Publication Type||Conference Proceedings|
|Year of Publication||1993|
|Authors||Qadri, S. B., Skelton E. F., Shimkunas A. R., and Butler J. E.|
|Conference Name||20th International Conference on Metallurgical Coatings and Thin Films|
|Conference Location||San Diego, Ca|
SiC films 0.2-2.0 mum thick have been characterized structurally by X-ray diffraction techniques. The films were deposited by electron cyclotron resonance-chemical vapor deposition techniques. No evidence of crystallinity was observed for films with thicknesses less than 1 mum; these are presumed to be amorphous. Thicker films were found to have crystallized predominantly in the a phase of SiC.