STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS
| Title | STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS |
| Publication Type | Conference Proceedings |
| Year of Publication | 1993 |
| Authors | Qadri, S. B., Skelton E. F., Shimkunas A. R., and Butler J. E. |
| Conference Name | 20th International Conference on Metallurgical Coatings and Thin Films |
| Pagination | 346-348 |
| Conference Location | San Diego, Ca |
| ISBN Number | 0257-8972 |
| Abstract | SiC films 0.2-2.0 mum thick have been characterized structurally by X-ray diffraction techniques. The films were deposited by electron cyclotron resonance-chemical vapor deposition techniques. No evidence of crystallinity was observed for films with thicknesses less than 1 mum; these are presumed to be amorphous. Thicker films were found to have crystallized predominantly in the a phase of SiC. |